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1. PLC+industrial computer can achieve manual, semi-automatic, and fully automatic control;
2. Equipped with an automatic constant pressure control and regulation system for process pressure;
3. Equipped with a water cut-off automatic alarm protection system to prevent damage to the growth substrate;
The door is a cylindrical double-layer water-cooled structure; Connected to the diffusion pump at the back (opposite to the door opening), according to the requirements of equipment electricity, gas, and water, the chassis needs to be water-cooled. The water-cooled electrode holes and electrodes must meet insulation, pass high current, support, water cooling, accuracy, and be connected to the power supply;
1. This machine is mainly used for developing conductive coating applications, such as BDD electrode anti-corrosion electrode, power battery electrode, etc;
2. It can be used to deposit thick diamond coatings, and the thickness on substrates with a diameter of 200 millimeters can reach millimeter level;
3. Can be used for depositing tool coatings, such as micro/nano diamond coatings, DLC, etc;
4. Can be used for depositing mold coatings, such as wire drawing molds, compression molds, etc;
Equipment name | Hot wire CVD diamond film deposition equipment |
Equipment model | HF600 |
Vacuum chamber structure | vertical front door structure, rear exhaust system, double-layer water cooling |
Vacuum chamber size | Φ600mmxH500mm |
Vacuum system | high vacuum pump system |
Substrate table size | Φ250mm²×300mm² square substrate stage (rotation, lifting optional) |
Substrate temperature | 600 ~ 1100℃ |
Power supply | dedicated hot wire power supply 800A, constant current or constant power mode |
Gas path control | 4-way gas flow control |
Control mode | PC+PLC+ touch screen control |
Footprint | host L1620mm×W1060mm×H1900mm |
Total power | ≥ 43kW |
